Oxyde de gallium(III), 99,995 % (base métallique), Thermo Scientific Chemicals

Pour dépôt sous vide

For vacuum deposition. In the production of catalysts. Used as part of the manufacturing of semiconductor devices. Has been shown to demonstrate catalytic properties and has also been used as an insulating barrier in tight junctions.

This Thermo Scientific Chemicals brand product was originally part of the Alfa Aesar product portfolio. Some documentation and label information may refer to the legacy brand. The original Alfa Aesar product / item code or SKU reference has not changed as a part of the brand transition to Thermo Scientific Chemicals.